Axcelis Technologies, Inc. provides high-productivity solutions for the semiconductor industry. The Company is focused on developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the critical and enabling steps in the IC manufacturing process. Its ion implantation products include high current ion implant, high energy ion implant and medium current ion implant. The Company's Purion H, Purion Dragon, Purion H200, and GSD/E2 Ovation spot beam, high current systems cover all traditional high current requirements as well as those associated with emerging and future devices. Its Purion XE, EXE, and other Purion high energy systems combine its production-proven RF Linac high energy, spot beam technology with the Purion platform wafer handling system. Its medium current ion implant products include its Purion M Si and SiC medium current systems. It also offers its customers aftermarket service and support.
企業コードACLS
会社名Axcelis Technologies Inc
上場日Jul 11, 2000
設立日1995
最高経営責任者「CEO」Dr. Russell J. Low, Ph.D.
従業員数1524
証券種類Ordinary Share
決算期末Jul 11
本社所在地108 Cherry Hill Dr
都市BEVERLY
証券取引所NASDAQ Global Select Consolidated
国United States of America
郵便番号01915
電話番号19782324001
ウェブサイトhttps://www.axcelis.com/
企業コードACLS
上場日Jul 11, 2000
設立日1995
過去5年間の配当金総支払額は
0.00
米ドルである。

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